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| TRAINING | Training is required to use this item and we can arrange this if needed. |
|---|
| CUSTODIAN | Zhaoxia Zhou |
|---|---|
| ADDITIONAL CONTACT | Stuart Robertson |
| Enquire about this item | |
| SITE | West Park |
Description
Bench-top plasma cleaning system used for the removal of organic contamination (hydrocarbon) from electron microscopy specimens and specimen holders.
Can also be used to remove carbon films from samples that have previously been carbon evaporation coated.
Plasma cleaning enhances electron microscopy imaginary and can be used to remove carbonaceous material for compositional surface analysis without causing damage surface or topography.
Sample must be attached to a stub or in the case of TEM, it must be 3mm to fit in the TEM holder.
Theory - Plasma cleaning
Specification
Plasma system:
- Ion energies less than 12eV
- Compatible with TEM specimen holders for FEI/Philips, Hitachi, JEOL, Zeiss/LEO, and Topcon
Vacuum system
- Ultimate vacuum of 1 x 10-7 mbar
Gas
- Nominal 10 psi (200 kPa) delivery pressure
- Flow rate is factory set and can be adjusted via a potentiometer located on the service panel
Dimensions
Weight
User interface
Upgrades
Ancillary equipment: TEM sample holder, SEM stub holder (upto 6 stubs), Quick Clamp holder (upto 5mm depth)
Future Upgrades
Item ID #.
Last Updated: 18th June, 2024
