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|MANUFACTURER||Fischione (manufacturer's website)|
|TRAINING||Training is required to use this item and we can arrange this if needed.|
|ADDITIONAL CONTACT||Scott Doak|
|Enquire about this item|
Bench-top plasma cleaning system used for the removal of organic contamination (hydrocarbon) from electron microscopy specimens and specimen holders.
Can also be used to remove carbon films from samples that have previously been carbon evaporation coated.
Plasma cleaning enhances electron microscopy imaginary and can be used to remove carbonaceous material for compositional surface analysis without causing damage surface or topography.
Sample must be attached to a stub or in the case of TEM, it must be 3mm to fit in the TEM holder.
In a nonequilibrium, high frequency plasma, free electrons are accelerated to high velocities by an oscillating electromagnetic field that excites gas atoms and creates the plasma. The plasma ions impinge upon the surface with energies of less than 12eV, which is below the specimen’s sputtering threshold. Cleaning is solely by reactive gas compounds formed by the plasma chemically reacting with carbonaceous material on the specimen and specimen holder. To optimize cleaning, a mixture of 25% oxygen and 75% argon is generally recommended. An oxygen plasma is highly effective in removing organic (hydrocarbon) contamination. The reaction yields H2O, CO, and CO2 that are evacuated by the vacuum system.
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Last Updated: 20th June, 2013