DualBeam (FIB-SEM) Microscope System

The Dual Beam FIB consists of a high resolution field emission electron column and gallium source ion column combined within the same instrument. This allows milling of cross sections (typically 20 x 5 microns) through samples and subsequent imaging using either electrons or ions.

Typical applications

• Cross sections through defects and the preparation of TEM samples from specific areas where this is impossible using conventional means. Features observed can be analysed in situ by EDX and EBSD.

Ancillary equipment

• Oxford Instruments X-Max 80, Energy-dispersive X-ray microanalysis (EDS) System.
• High speed electrostatic beam blanker.
• OMNIPROBE micromanipulator.
• 2 Gas Injectors (Platinum and Insulator enhance etch (IEE)).
• Solid state retractable backscatter detector with low voltage capability.