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Bench-top sputter coating system with 165mm chamber and gold/palladium sputtering target. The sputter coater produces a fine grain, even coating ideally suited for depositing layers over a wide area. Typical applications include coating of non-conducting SEM or TEM samples. Coating thickness depends on time and current, but normally in the region of 1-20 nanometers.
The coating time is monitored with a 999 second timer with 1 second resolution. Pressure levels and plasma currents are monitored by analogue meters.
Two modes of operation:
Sample stage is height adjustable and can be removed if necessary for large samples.
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Last Updated: 9th October, 2012