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|MANUFACTURER||FEI (manufacturer's website)|
|MODEL||Nova 600 Nanolab Dual Beam|
|TRAINING||Training is required to use this item and we can arrange this if needed.|
|ADDITIONAL CONTACT||Scott Doak|
|Enquire about this item|
The Dual Beam FIB consists of a high resolution field emission electron column and gallium source ion column combined within the same instrument. This allows milling of cross sections (typically 20 x 5 microns) through samples and subsequent imaging using either electrons or ions.
Resolution @ optimum WD 1.1 nm @ 15 kV (TLD-SE) 2.5 nm @ 1 kV (TLD-SE) 3.5 nm @ 500V TLD-SE 5.5 nm @ 500 V TLD-BSE
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Last Updated: 14th June, 2013